High Purity titanium application High Purity titanium are used as sputtering target materials for Thin-film formations of semiconductors including DRAMS.Titanium ingots(Purity 3N-5N) with dimensions of D200/D300/D400*L600~1200mm are available.With little Fe and Oxygen contents（Fe less than 3ppm，O less than 160ppm）can be customized. Titanium target We can provide titanium target with desired size，shape and purity for various fields，including semiconductor，LCD and solar energy. Spherical Titanium powder Spherical titanium powder is widely applied in industrial production such as additive manufacturing，MIM processing and powder metallurgy，325mesh spherical titanium powder that purity is up to 99.995% with Oxygen level less than 0.1%. High Purity Titanium pellet/slug High purity titanium pellet/slug is widely used for vacuum coating.Dimension of the products can be customized.We have Dia6*6mm instock. High purity Titanium processing ： High puri...